Team:EPF Lausanne/Microfluidics/Making/PartII
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<a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics/Making/PartI" class="btn btn-primary pull-left" role="button"><- Making a chip part I</a> | <a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics/Making/PartI" class="btn btn-primary pull-left" role="button"><- Making a chip part I</a> | ||
- | <h1 class="cntr">Chip manufacturing</h1> | + | <h1 id="chipmanufacturing" class="cntr">Chip manufacturing</h1> |
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- | <li class="active"><a href="# | + | <li class="active"><a href="#chipmanufacturing">Chip manufacturing</a></li> |
<li><a href="#flowlayer">Flow layer process outline</a></li> | <li><a href="#flowlayer">Flow layer process outline</a></li> | ||
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Revision as of 21:14, 17 October 2014
<- Making a chip part I
Chip manufacturing
The chip creation procedure is divided into several steps. These steps are summarized in the figure below. First one needs to create a mask (see c) in order to obtain a master (see d) starting from a silicon wafer (see a). For the specific procedure of mask and wafer creation, see Part I. Once the master is ready it can be used as a mold to create the PDMS chip.
Here is a non-exhaustive step by step presentation. For the precise procedure you can refer to our notebook protocol.
<- Making a chip part I