Team:EPF Lausanne/Microfluidics/Making/PartII
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+ | <li><a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics">Designing a chip</a></li> | ||
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+ | <a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics/Making/PartI" class="btn btn-primary pull-left" role="button">>- Making a chip part I</a> | ||
<h1>Chip manufacturing</h1> | <h1>Chip manufacturing</h1> | ||
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<td class="cntr"><a href="https://static.igem.org/mediawiki/2014/8/8d/Grg10.JPG" data-lightbox="img1" data-title="Aligning both control & flow layers"><img src="https://static.igem.org/mediawiki/2014/8/8d/Grg10.JPG" width="60%"/></a></td> | <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/8/8d/Grg10.JPG" data-lightbox="img1" data-title="Aligning both control & flow layers"><img src="https://static.igem.org/mediawiki/2014/8/8d/Grg10.JPG" width="60%"/></a></td> | ||
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<td>The chips are almost done now. After the second bake, the last inlets need to be punched for the flow inlets and the general outlet. The last step is to assemble the chip to a glass slide. For this we can either choose a normal treatment where the chip is baked again overnight on the glass slide or plasma treated for a better bonding strength. The ionization of the gas during the plasma treatment produces a violet light.</td> | <td>The chips are almost done now. After the second bake, the last inlets need to be punched for the flow inlets and the general outlet. The last step is to assemble the chip to a glass slide. For this we can either choose a normal treatment where the chip is baked again overnight on the glass slide or plasma treated for a better bonding strength. The ionization of the gas during the plasma treatment produces a violet light.</td> | ||
<td class="cntr"><a href="https://static.igem.org/mediawiki/2014/5/52/Greg11.JPG" data-lightbox="img1" data-title="Chip is placed to recieve the plasma treatment"><img src="https://static.igem.org/mediawiki/2014/5/52/Greg11.JPG" width="60%"/></a> | <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/5/52/Greg11.JPG" data-lightbox="img1" data-title="Chip is placed to recieve the plasma treatment"><img src="https://static.igem.org/mediawiki/2014/5/52/Greg11.JPG" width="60%"/></a> | ||
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+ | <a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics/Making/PartI" class="btn btn-primary pull-left" role="button">>- Making a chip part I</a> | ||
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Revision as of 14:09, 16 October 2014
>- Making a chip part I
Chip manufacturing
The chip creation procedure is divided into several steps. These steps are summarized in the figure below. First one needs to create a mask (see c) in order to obtain a master (see d) starting from a silicon wafer (see a). For the specific procedure of mask and wafer creation, see Part I. Once the master is ready it can be used as a mold to create the PDMS chip.
Here is a non-exhaustive step by step presentation. For the precise procedure you can refer to our notebook protocol.
>- Making a chip part I