Team:EPF Lausanne/Microfluidics/Making/PartII

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<h1>Chip manufacturing</h1>
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<a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics/Making/PartI" class="btn btn-primary pull-left" role="button">&lt;- Making a chip part I</a>
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<h1 id="chipmanufacturing" class="cntr">Chip manufacturing</h1>
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<p class="lead">The chip creation procedure is divided into several steps. These steps are summarized in the figure above. First one needs to create a mask (see c) in order to obtain a master (see d) starting from a silicon wafer (see a). For the specific procedure of mask and wafer creation, see Part I. Once the master is ready it can be used as a mold to create the PDMS chip.</p>
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<p class="lead">The chip creation procedure is divided into several steps. These steps are summarized in the figure below. First one needs to create a mask (see c) in order to obtain a master (see d) starting from a silicon wafer (see a). For the specific procedure of mask and wafer creation, see <a target="_blank" href="https://2014.igem.org/wiki/index.php?title=Team:EPF_Lausanne/Microfluidics/Making/PartI">Part I</a>. Once the master is ready it can be used as a mold to create the PDMS chip.</p>
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<a href="https://static.igem.org/mediawiki/2014/a/a7/Process.png" data-lightbox="img1" data-title="Chip-making steps"><img src="https://static.igem.org/mediawiki/2014/a/a7/Process.png"></a>
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<a href="https://static.igem.org/mediawiki/2014/a/a7/Process.png" data-lightbox="img1" data-title="Chip-making steps"><img src="https://static.igem.org/mediawiki/2014/a/a7/Process.png" class="img-responsive"></a>
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<h2 id="stepbystep" >Step by step</h2>
<p class="lead">Here is a non-exhaustive step by step presentation. For the precise procedure you can refer to our <a target="_blank" href="https://2014.igem.org/Team:EPF_Lausanne/Notebook/Microfluidics">notebook protocol</a>.</p>
<p class="lead">Here is a non-exhaustive step by step presentation. For the precise procedure you can refer to our <a target="_blank" href="https://2014.igem.org/Team:EPF_Lausanne/Notebook/Microfluidics">notebook protocol</a>.</p>
<table class="table table-striped valign-middle">
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      <th>Process description</th>
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       <td>The PDMS mixture is precisely weighted. The ratio of organic polymer to curing agent is an important factor for a good chip consistency.</td>
       <td>The PDMS mixture is precisely weighted. The ratio of organic polymer to curing agent is an important factor for a good chip consistency.</td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/c/cd/Greg1.png" data-lightbox="img1" data-title="Weighting PDMS"><img src="https://static.igem.org/mediawiki/2014/c/cd/Greg1.png" width="80%"/></a></td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/e/e4/Greg1.JPG" data-lightbox="img1" data-title="Weighting PDMS"><img src="https://static.igem.org/mediawiki/2014/e/e4/Greg1.JPG" width="60%"/></a></td>
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<tr>
<tr>
       <td>Once the mixtures are ready, they need to be mixed thoroughly in a centrifugal mixer.</td>
       <td>Once the mixtures are ready, they need to be mixed thoroughly in a centrifugal mixer.</td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/d/d0/Greg2.png" data-lightbox="img1" data-title="Mix in the centrifugal mixer"><img src="https://static.igem.org/mediawiki/2014/d/d0/Greg2.png" width="80%"/></a></td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/6/6d/Greg2.JPG" data-lightbox="img1" data-title="Mix in the centrifugal mixer"><img src="https://static.igem.org/mediawiki/2014/6/6d/Greg2.JPG" width="60%"/></a></td>
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     <tr>
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       <td>The PDMS mixture is precisely weighted. The ratio of organic polymer to curing agent is an important factor for a good chip consistency.</td>
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       <td>The PDMS can then be poured on the wafers, one for the flow layer and one for the control layer. All dust particles are blown away before pouring on the mold.</td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/8/8c/Asdfghjklkjhgfds.JPG" data-lightbox="img1" data-title="Weighting PDMS"><img src="https://static.igem.org/mediawiki/2014/8/8c/Asdfghjklkjhgfds.JPG" width="80%"/></a></td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/d/d5/Greg3.JPG" data-lightbox="img1" data-title="Blowing away all dust particles"><img src="https://static.igem.org/mediawiki/2014/d/d5/Greg3.JPG" width="60%"/></a></td>
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     </tr>
     <tr>
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       <td>The PDMS mixture is precisely weighted. The ratio of organic polymer to curing agent is an important factor for a good chip consistency.</td>
+
       <td>As the control layer is thicker than the flow layer, it can contain (unwanted!) bubbles. The wafer is therefore vacuumed for 20 min in order to remove them.</td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/c/cd/Greg1.png" data-lightbox="img1" data-title="Weighting PDMS"><img src="https://static.igem.org/mediawiki/2014/c/cd/Greg1.png" width="80%"/></a></td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/8/81/Greg4.JPG" data-lightbox="img1" data-title="Vacuming control layer"><img src="https://static.igem.org/mediawiki/2014/8/81/Greg4.JPG" width="60%"/></a></td>
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       <td>The PDMS mixture is precisely weighted. The ratio of organic polymer to curing agent is an important factor for a good chip consistency.</td>
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       <td>To obtain the desired thickness of the flow layer, the PDMS is briefly spin coated on the wafer.</td>
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       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/c/cd/Greg1.png" data-lightbox="img1" data-title="Weighting PDMS"><img src="https://static.igem.org/mediawiki/2014/c/cd/Greg1.png" width="80%"/></a></td>
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      <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/b/b3/Greg5.JPG" data-lightbox="img1" data-title="Wafer is being placed to be spun"><img src="https://static.igem.org/mediawiki/2014/b/b3/Greg5.JPG" width="60%"/></a></td>
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    </tr>
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    <tr>
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      <td>The wafers are now ready for their first baking. They are placed in the 80 °C oven for 30 minutes</td>
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      <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/4/49/Greg6.JPG" data-lightbox="img1" data-title="Wafer is placed in the oven (80 ºC)"><img src="https://static.igem.org/mediawiki/2014/4/49/Greg6.JPG" width="60%"/></a></td>
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    </tr>
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    <tr>
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      <td>When the wafers come out of the oven, chips are cut out of the control layer using a scalpel. In our case we usually have three chips per wafer.<br/>
 +
At this point the inlets need to be perforated through the control layer with a hole puncher.</td>
 +
<td class="cntr">
 +
      <a href="https://static.igem.org/mediawiki/2014/4/43/Greg7.JPG" data-lightbox="img1" data-title="Punching holes in the chip"><img src="https://static.igem.org/mediawiki/2014/4/43/Greg7.JPG" width="54%" class="pull-left" /></a>
 +
<a href="https://static.igem.org/mediawiki/2014/6/62/Greg8.JPG" data-lightbox="img1" data-title="Punching holes in the chip"><img src="https://static.igem.org/mediawiki/2014/6/62/Greg8.JPG" width="46%" class="pull-right"/></a>
 +
<br/>
 +
<a href="https://static.igem.org/mediawiki/2014/2/2f/Greg9.JPG" data-lightbox="img1" data-title="Close-up of the hole-punching process"><img src="https://static.igem.org/mediawiki/2014/2/2f/Greg9.JPG" width="46%" class="pull-right"/></a>
 +
</td>
 +
  </tr>
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<tr>
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      <td>We are now at the point of aligning the control layer to the flow layer. This is the tricky part of the preparation where we need to align the layers (very) precisely and be sure that no dust or particle come in between the two layers. This is done under a stereo microscope. Once they are aligned properly, they go back in the oven for 2 hours in order to bond them together.</td>
 +
      <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/8/8d/Grg10.JPG" data-lightbox="img1" data-title="Aligning both control & flow layers"><img src="https://static.igem.org/mediawiki/2014/8/8d/Grg10.JPG" width="60%"/></a></td>
 +
    </tr>
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    <tr>
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      <td>The chips are almost done now. After the second bake, the last inlets need to be punched for the flow inlets and the general outlet. The last step is to assemble the chip to a glass slide. For this we can either choose a normal treatment where the chip is baked again overnight on the glass slide or plasma treated for a better bonding strength. The ionization of the gas during the plasma treatment produces a violet light.</td>
 +
       <td class="cntr"><a href="https://static.igem.org/mediawiki/2014/5/52/Greg11.JPG" data-lightbox="img1" data-title="Chip is placed to recieve the plasma treatment"><img src="https://static.igem.org/mediawiki/2014/5/52/Greg11.JPG" width="60%"/></a>
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<a href="https://static.igem.org/mediawiki/2014/9/93/Greg12.JPG" data-lightbox="img1" data-title="Plasma treatment (Alien zzwzwzzwzw)"><img src="https://static.igem.org/mediawiki/2014/9/93/Greg12.JPG" width="60%"/></a>
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</td>
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<a href="https://2014.igem.org/Team:EPF_Lausanne/Microfluidics/Making/PartI" class="btn btn-primary pull-left" role="button">&lt;- Making a chip part I</a>
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Latest revision as of 01:17, 18 October 2014

<- Making a chip part I

Chip manufacturing


The chip creation procedure is divided into several steps. These steps are summarized in the figure below. First one needs to create a mask (see c) in order to obtain a master (see d) starting from a silicon wafer (see a). For the specific procedure of mask and wafer creation, see Part I. Once the master is ready it can be used as a mold to create the PDMS chip.


Step by step

Here is a non-exhaustive step by step presentation. For the precise procedure you can refer to our notebook protocol.

Process description Pictures
The PDMS mixture is precisely weighted. The ratio of organic polymer to curing agent is an important factor for a good chip consistency.
Once the mixtures are ready, they need to be mixed thoroughly in a centrifugal mixer.
The PDMS can then be poured on the wafers, one for the flow layer and one for the control layer. All dust particles are blown away before pouring on the mold.
As the control layer is thicker than the flow layer, it can contain (unwanted!) bubbles. The wafer is therefore vacuumed for 20 min in order to remove them.
To obtain the desired thickness of the flow layer, the PDMS is briefly spin coated on the wafer.
The wafers are now ready for their first baking. They are placed in the 80 °C oven for 30 minutes
When the wafers come out of the oven, chips are cut out of the control layer using a scalpel. In our case we usually have three chips per wafer.
At this point the inlets need to be perforated through the control layer with a hole puncher.

We are now at the point of aligning the control layer to the flow layer. This is the tricky part of the preparation where we need to align the layers (very) precisely and be sure that no dust or particle come in between the two layers. This is done under a stereo microscope. Once they are aligned properly, they go back in the oven for 2 hours in order to bond them together.
The chips are almost done now. After the second bake, the last inlets need to be punched for the flow inlets and the general outlet. The last step is to assemble the chip to a glass slide. For this we can either choose a normal treatment where the chip is baked again overnight on the glass slide or plasma treated for a better bonding strength. The ionization of the gas during the plasma treatment produces a violet light.
<- Making a chip part I

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