"
Team:EPF Lausanne/Microfluidics/Making/PartI
From 2014.igem.org
(Difference between revisions)
Arthurgiroux (Talk | contribs) |
Arthurgiroux (Talk | contribs) |
||
| Line 109: | Line 109: | ||
<tbody> | <tbody> | ||
<tr> | <tr> | ||
| - | <td>01</td> | + | <td><b>01</b></td> |
<td></td> | <td></td> | ||
<td></td> | <td></td> | ||
<td class="cntr"><img src="https://static.igem.org/mediawiki/2014/d/d8/Cr_blank_fab1.gif" /><br /> | <td class="cntr"><img src="https://static.igem.org/mediawiki/2014/d/d8/Cr_blank_fab1.gif" /><br /> | ||
Cross section of a photolithography mask</td> | Cross section of a photolithography mask</td> | ||
| + | </tr> | ||
| + | |||
| + | <tr> | ||
| + | <td><b>02</b></td> | ||
| + | <td><b>Laser exposure</b></td> | ||
| + | <td class="cntr"><img src="https://static.igem.org/mediawiki/2014/8/81/DWL200_intro.jpg" /><br /> | ||
| + | Heidelberg DWL200, Laser lithography system</td> | ||
| + | <td class="cntr"><img src="https://static.igem.org/mediawiki/2014/9/9e/Cr_blank_fab2.gif" /><br /> | ||
| + | The laser beams on the surface of the photoresist. By doing so, it imprints the pattern of the design on the PR.</td> | ||
</tr> | </tr> | ||
</tbody> | </tbody> | ||
Revision as of 17:43, 9 October 2014
| Step | Process description | Machines | Cross-section after process |
|---|---|---|---|
| 01 |  Cross section of a photolithography mask |
||
| 02 | Laser exposure |  Heidelberg DWL200, Laser lithography system |
 The laser beams on the surface of the photoresist. By doing so, it imprints the pattern of the design on the PR. |
Sponsors
Copyright © iGEM EPFL 2014. All Rights Reserved
